Show simple item record

Epitaxial chemical vapor deposition of silicon on an oxygen monolayer on Si(100) substrates

dc.contributor.authorDelabie, Annelies
dc.contributor.authorJayachandran, Suseendran
dc.contributor.authorCaymax, Matty
dc.contributor.authorLoo, Roger
dc.contributor.authorMaggen, Jens
dc.contributor.authorPourtois, Geoffrey
dc.contributor.authorDouhard, Bastien
dc.contributor.authorConard, Thierry
dc.contributor.authorMeersschaut, Johan
dc.contributor.authorLenka, Hara
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorHeyns, Marc
dc.date.accessioned2021-10-21T07:16:12Z
dc.date.available2021-10-21T07:16:12Z
dc.date.issued2013-09
dc.identifier.issn2162-8726
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/22248
dc.sourceIIOimport
dc.titleEpitaxial chemical vapor deposition of silicon on an oxygen monolayer on Si(100) substrates
dc.typeJournal article
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.imecauthorJayachandran, Suseendran
dc.contributor.imecauthorCaymax, Matty
dc.contributor.imecauthorLoo, Roger
dc.contributor.imecauthorPourtois, Geoffrey
dc.contributor.imecauthorDouhard, Bastien
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorMeersschaut, Johan
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.contributor.orcidimecPourtois, Geoffrey::0000-0003-2597-8534
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecMeersschaut, Johan::0000-0003-2467-1784
dc.source.peerreviewyes
dc.source.beginpageP104
dc.source.endpageP106
dc.source.journalECS Solid State Letters
dc.source.issue11
dc.source.volume2
imec.availabilityPublished - imec


Files in this item

FilesSizeFormatView

There are no files associated with this item.

This item appears in the following collection(s)

Show simple item record