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Modeling strategies for EUV mask multilayer defect dispositioning

dc.contributor.authorErdman, Andreas
dc.contributor.authorEvanschitzky, Peter
dc.contributor.authorBret, Tristan
dc.contributor.authorJonckheere, Rik
dc.date.accessioned2021-10-21T07:30:48Z
dc.date.available2021-10-21T07:30:48Z
dc.date.issued2013
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/22316
dc.sourceIIOimport
dc.titleModeling strategies for EUV mask multilayer defect dispositioning
dc.typeProceedings paper
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.source.peerreviewyes
dc.source.beginpage86790Y
dc.source.conferenceExtreme Ultraviolet (EUV) Lithography IV
dc.source.conferencedate24/02/2013
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol. 8679


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