dc.contributor.author | Goethals, F. | |
dc.contributor.author | Levrau, E. | |
dc.contributor.author | Pollefeyt, G. | |
dc.contributor.author | Baklanov, Mikhaïl | |
dc.contributor.author | Ciofi, Ivan | |
dc.contributor.author | Vanstreels, Kris | |
dc.contributor.author | Detavernier, C. | |
dc.contributor.author | Van Driessche, I. | |
dc.contributor.author | Van Der Voort, P. | |
dc.date.accessioned | 2021-10-21T07:53:35Z | |
dc.date.available | 2021-10-21T07:53:35Z | |
dc.date.issued | 2013 | |
dc.identifier.issn | 2050-7526 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/22407 | |
dc.source | IIOimport | |
dc.title | Sealed ultra low-k organosilica films with unprecedented electrical and mechanical properties | |
dc.type | Journal article | |
dc.contributor.imecauthor | Ciofi, Ivan | |
dc.contributor.imecauthor | Vanstreels, Kris | |
dc.contributor.orcidimec | Ciofi, Ivan::0000-0003-1374-4116 | |
dc.contributor.orcidimec | Vanstreels, Kris::0000-0002-4420-0966 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 3961 | |
dc.source.endpage | 3966 | |
dc.source.journal | Journal of Materials Chemistry C | |
dc.source.issue | 25 | |
dc.source.volume | 1 | |
dc.identifier.url | http://pubs.rsc.org/en/content/articlelanding/2013/tc/c3tc30522h#!divAbstract | |
imec.availability | Published - imec | |