dc.contributor.author | Grella, Luca | |
dc.contributor.author | Carroll, Alan | |
dc.contributor.author | Murray, Kirk | |
dc.contributor.author | McCord, Mark A. | |
dc.contributor.author | Tong, William M. | |
dc.contributor.author | Brodie, Alan D. | |
dc.contributor.author | Gubiotti, Thomas | |
dc.contributor.author | Sun, Fuge | |
dc.contributor.author | Kidwingira, Francoise | |
dc.contributor.author | Kojima, Shinichi | |
dc.contributor.author | Petric, Paul | |
dc.contributor.author | Bevis, Christopher F. | |
dc.contributor.author | Vereecke, Bart | |
dc.contributor.author | Haspeslagh, Luc | |
dc.contributor.author | Mane, Anil U. | |
dc.contributor.author | Elam, Jeffrey W. | |
dc.date.accessioned | 2021-10-21T08:00:22Z | |
dc.date.available | 2021-10-21T08:00:22Z | |
dc.date.issued | 2013 | |
dc.identifier.issn | 1537-1646 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/22430 | |
dc.source | IIOimport | |
dc.title | Digital pattern generator: an electron-optical MEMS for massively parallel reflective electron beam lithography | |
dc.type | Journal article | |
dc.contributor.imecauthor | Vereecke, Bart | |
dc.contributor.imecauthor | Haspeslagh, Luc | |
dc.identifier.doi | 10.1117/1.JMM.12.3.031107 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 31107 | |
dc.source.journal | Journal of Micro/Nanolithography MEMS and MOEMS | |
dc.source.issue | 3 | |
dc.source.volume | 12 | |
dc.identifier.url | http://nanolithography.spiedigitallibrary.org/article.aspx?articleid=1724607 | |
imec.availability | Published - imec | |