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Readying directed self-assembly for patterning in semi-conductor manufacturing

dc.contributor.authorGronheid, Roel
dc.contributor.authorRincon Delgadillo, Paulina
dc.contributor.authorSingh, Arjun
dc.contributor.authorYounkin, Todd
dc.contributor.authorSayan, Safak
dc.contributor.authorChan, BT
dc.contributor.authorVan Look, Lieve
dc.contributor.authorBekaert, Joost
dc.contributor.authorPollentier, Ivan
dc.contributor.authorNealey, Paul
dc.date.accessioned2021-10-21T08:01:28Z
dc.date.available2021-10-21T08:01:28Z
dc.date.issued2013
dc.identifier.issn0914-9244
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/22434
dc.sourceIIOimport
dc.titleReadying directed self-assembly for patterning in semi-conductor manufacturing
dc.typeJournal article
dc.contributor.imecauthorGronheid, Roel
dc.contributor.imecauthorRincon Delgadillo, Paulina
dc.contributor.imecauthorSingh, Arjun
dc.contributor.imecauthorChan, BT
dc.contributor.imecauthorVan Look, Lieve
dc.contributor.imecauthorBekaert, Joost
dc.contributor.imecauthorPollentier, Ivan
dc.contributor.orcidimecChan, BT::0000-0003-2890-0388
dc.contributor.orcidimecBekaert, Joost::0000-0003-3075-3479
dc.contributor.orcidimecPollentier, Ivan::0000-0002-4266-6500
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage779
dc.source.endpage791
dc.source.journalJournal of Photopolymer Science and Technology
dc.source.issue6
dc.source.volume26
dc.identifier.urlhttps://www.jstage.jst.go.jp/article/photopolymer/26/6/26_779/_article
imec.availabilityPublished - open access


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