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Influences of metal, non-metal precursors, and substrates on atomic layer deposition processes

dc.contributor.authorHan, Jeong Hwan
dc.contributor.authorLee, Sang Woon
dc.contributor.authorChoi, Byung Joon
dc.contributor.authorEom, Taeyong
dc.contributor.authorKim, Seong Keun
dc.contributor.authorSong, Seul Ji
dc.contributor.authorLee, Woongkyu
dc.contributor.authorHwang, cheol seong
dc.date.accessioned2021-10-21T08:07:42Z
dc.date.available2021-10-21T08:07:42Z
dc.date.issued2013
dc.identifier.issn0010-8545
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/22457
dc.sourceIIOimport
dc.titleInfluences of metal, non-metal precursors, and substrates on atomic layer deposition processes
dc.typeJournal article
dc.source.peerreviewyes
dc.source.beginpage3154
dc.source.endpage3176
dc.source.journalCoordination Chemistry Reviews
dc.source.issue23_24
dc.source.volume257
dc.identifier.urlhttp://www.sciencedirect.com/science/article/pii/S0010854513000933
imec.availabilityPublished - imec


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