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A year of new mask defectivity insights in imec's EUVL program

dc.contributor.authorJonckheere, Rik
dc.contributor.authorVan Den Heuvel, Dieter
dc.contributor.authorBaudemprez, Bart
dc.contributor.authorJehoul, Christiane
dc.contributor.authorPacco, Antoine
dc.date.accessioned2021-10-21T08:36:24Z
dc.date.available2021-10-21T08:36:24Z
dc.date.issued2013
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/22555
dc.sourceIIOimport
dc.titleA year of new mask defectivity insights in imec's EUVL program
dc.typeProceedings paper
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.imecauthorVan Den Heuvel, Dieter
dc.contributor.imecauthorBaudemprez, Bart
dc.contributor.imecauthorJehoul, Christiane
dc.contributor.imecauthorPacco, Antoine
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.contributor.orcidimecPacco, Antoine::0000-0001-6330-5053
dc.source.peerreviewyes
dc.source.conferenceInternational Symposium on Extrem Ultraviolet Lithography - EUVL
dc.source.conferencedate7/10/2013
dc.source.conferencelocationToyama Japan
dc.identifier.urlwww.sematech.org/10386
imec.availabilityPublished - imec


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