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Lens wavefront compensation for 3D photomask effects in subwavelength optical lithography

dc.contributor.authorKempsell Sears, Monica
dc.contributor.authorBekaert, Joost
dc.contributor.authorSmith, Bruce W.
dc.date.accessioned2021-10-21T08:43:13Z
dc.date.available2021-10-21T08:43:13Z
dc.date.issued2013
dc.identifier.issn0003-6935
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/22576
dc.sourceIIOimport
dc.titleLens wavefront compensation for 3D photomask effects in subwavelength optical lithography
dc.typeJournal article
dc.contributor.imecauthorBekaert, Joost
dc.contributor.orcidimecBekaert, Joost::0000-0003-3075-3479
dc.source.peerreviewyes
dc.source.beginpage314
dc.source.endpage322
dc.source.journalApplied Optics
dc.source.issue3
dc.source.volume52
dc.identifier.urlhttp://www.opticsinfobase.org/ao/abstract.cfm?uri=ao-52-3-314
imec.availabilityPublished - imec


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