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Direct imaging of 3D atomic-scale dopant-defect clustering processes in ion-implanted silicon

dc.contributor.authorKoelling, Sebastian
dc.contributor.authorRichard, Olivier
dc.contributor.authorBender, Hugo
dc.contributor.authorUematsu, M.
dc.contributor.authorSchulze, Andreas
dc.contributor.authorZschaetzsch, Gerd
dc.contributor.authorGilbert, Matthieu
dc.contributor.authorVandervorst, Wilfried
dc.date.accessioned2021-10-21T08:54:47Z
dc.date.available2021-10-21T08:54:47Z
dc.date.issued2013
dc.identifier.issn1530-6984
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/22610
dc.sourceIIOimport
dc.titleDirect imaging of 3D atomic-scale dopant-defect clustering processes in ion-implanted silicon
dc.typeJournal article
dc.contributor.imecauthorRichard, Olivier
dc.contributor.imecauthorBender, Hugo
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.orcidimecRichard, Olivier::0000-0002-3994-8021
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage2458
dc.source.endpage2462
dc.source.journalNano Letters
dc.source.issue6
dc.source.volume13
imec.availabilityPublished - open access


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