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Ultra-low k dielectric and plasma damage control for advanced technology nodes (10-nm and below)

dc.contributor.authorLazzarino, Frederic
dc.contributor.authorKrishtab, Mikhail
dc.contributor.authorTahara, Shigeru
dc.contributor.authorBaklanov, Mikhaïl
dc.date.accessioned2021-10-21T09:08:08Z
dc.date.available2021-10-21T09:08:08Z
dc.date.issued2013
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/22652
dc.sourceIIOimport
dc.titleUltra-low k dielectric and plasma damage control for advanced technology nodes (10-nm and below)
dc.typeMeeting abstract
dc.contributor.imecauthorLazzarino, Frederic
dc.contributor.imecauthorKrishtab, Mikhail
dc.contributor.orcidimecLazzarino, Frederic::0000-0001-7961-9727
dc.source.peerreviewno
dc.source.beginpage240
dc.source.conferenceAVS 60th International Symposium and Exhibition
dc.source.conferencedate28/10/2013
dc.source.conferencelocationLong Beach, CA USA
dc.identifier.urlhttp://www2.avs.org/symposium/avs60/pdfs/abstractbook.pdf
imec.availabilityPublished - imec


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