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Charge retention in a patterned SiO2/Si3N4 electret

dc.contributor.authorLeonov, Vladimir
dc.contributor.authorvan Schaijk, Rob
dc.contributor.authorVan Hoof, Chris
dc.date.accessioned2021-10-21T09:13:51Z
dc.date.available2021-10-21T09:13:51Z
dc.date.issued2013
dc.identifier.issn1530-437X
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/22668
dc.sourceIIOimport
dc.titleCharge retention in a patterned SiO2/Si3N4 electret
dc.typeJournal article
dc.contributor.imecauthorLeonov, Vladimir
dc.contributor.imecauthorVan Hoof, Chris
dc.contributor.orcidimecLeonov, Vladimir::0000-0002-4364-8945
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage3369
dc.source.endpage3376
dc.source.journalIEEE Sensors Journal
dc.source.issue9
dc.source.volume13
imec.availabilityPublished - open access


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