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Deep ultraviolet out-of-band characterization of EUVL scanners and resists

dc.contributor.authorLorusso, Gian
dc.contributor.authorMatsumiya, T.
dc.contributor.authorIwashita, Jun
dc.contributor.authorHirayama, T.
dc.contributor.authorHendrickx, Eric
dc.date.accessioned2021-10-21T09:33:57Z
dc.date.available2021-10-21T09:33:57Z
dc.date.issued2013
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/22724
dc.sourceIIOimport
dc.titleDeep ultraviolet out-of-band characterization of EUVL scanners and resists
dc.typeProceedings paper
dc.contributor.imecauthorLorusso, Gian
dc.contributor.imecauthorHendrickx, Eric
dc.source.peerreviewyes
dc.source.beginpage86792V
dc.source.conferenceExtreme Ultraviolet (EUV) Lithography IV
dc.source.conferencedate25/02/2013
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol. 8679


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