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Photolithographic patterning of organic Semiconductors

dc.contributor.authorMalinowski, Pawel
dc.contributor.authorSteudel, Soeren
dc.contributor.authorKe, Tung Huei
dc.contributor.authorHeremans, Paul
dc.contributor.authorNakamura, Atsushi
dc.date.accessioned2021-10-21T09:44:26Z
dc.date.available2021-10-21T09:44:26Z
dc.date.issued2013
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/22753
dc.sourceIIOimport
dc.titlePhotolithographic patterning of organic Semiconductors
dc.typeProceedings paper
dc.contributor.imecauthorMalinowski, Pawel
dc.contributor.imecauthorKe, Tung Huei
dc.contributor.imecauthorHeremans, Paul
dc.contributor.orcidimecMalinowski, Pawel::0000-0002-2934-470X
dc.contributor.orcidimecKe, Tung Huei::0000-0001-8381-4998
dc.contributor.orcidimecHeremans, Paul::0000-0003-2151-1718
dc.source.peerreviewno
dc.source.conferenceAdvanced Lithography Workshop
dc.source.conferencedate12/09/2013
dc.source.conferencelocationDresden Germany
imec.availabilityPublished - imec


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