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Improvement of seed layer smoothness for epitaxial growth on porous silicon

dc.contributor.authorMartini, Roberto
dc.contributor.authorSivaramakrishnan Radhakrishnan, Hariharsudan
dc.contributor.authorDepauw, Valerie
dc.contributor.authorVan Nieuwenhuysen, Kris
dc.contributor.authorGordon, Ivan
dc.contributor.authorGonzalez, Mario
dc.contributor.authorPoortmans, Jef
dc.date.accessioned2021-10-21T09:53:21Z
dc.date.available2021-10-21T09:53:21Z
dc.date.issued2013
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/22777
dc.sourceIIOimport
dc.titleImprovement of seed layer smoothness for epitaxial growth on porous silicon
dc.typeProceedings paper
dc.contributor.imecauthorSivaramakrishnan Radhakrishnan, Hariharsudan
dc.contributor.imecauthorDepauw, Valerie
dc.contributor.imecauthorGordon, Ivan
dc.contributor.imecauthorGonzalez, Mario
dc.contributor.imecauthorPoortmans, Jef
dc.contributor.orcidimecSivaramakrishnan Radhakrishnan, Hariharsudan::0000-0003-1963-273X
dc.contributor.orcidimecDepauw, Valerie::0000-0003-2045-9698
dc.contributor.orcidimecGordon, Ivan::0000-0002-0713-8403
dc.contributor.orcidimecPoortmans, Jef::0000-0003-2077-2545
dc.source.peerreviewyes
dc.source.beginpageA9.03
dc.source.conferenceFilm Silicon Science and Technology
dc.source.conferencedate1/04/2013
dc.source.conferencelocationSan Francisco, CA USA
imec.availabilityPublished - imec
imec.internalnotesMRS Symposium Proceedings; Vol. 1536


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