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Critical dimension uniformity and contact edge roughness in extreme ultraviolet lithography: effect of photoacid generator, sensitizer and quencher

dc.contributor.authorMurugesan Kuppuswamy, Vijaya-Kumar
dc.contributor.authorConstantoudis, Vassilios
dc.contributor.authorGogolides, Evangelos
dc.contributor.authorVaglio Pret, Alessandro
dc.contributor.authorGronheid, Roel
dc.date.accessioned2021-10-21T10:17:25Z
dc.date.available2021-10-21T10:17:25Z
dc.date.issued2013
dc.identifier.issn1537-1646
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/22838
dc.sourceIIOimport
dc.titleCritical dimension uniformity and contact edge roughness in extreme ultraviolet lithography: effect of photoacid generator, sensitizer and quencher
dc.typeJournal article
dc.contributor.imecauthorVaglio Pret, Alessandro
dc.contributor.imecauthorGronheid, Roel
dc.source.peerreviewyes
dc.source.beginpage23003
dc.source.journalJournal of Micro/Nanolithography MEMS and MOEMS
dc.source.issue2
dc.source.volume12
imec.availabilityPublished - imec


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