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Molecular glass resists for all-dry high-resolution scanning probe lithography

dc.contributor.authorNeuber, Christian
dc.contributor.authorCooke, Mike
dc.contributor.authorDespont, Michel
dc.contributor.authorDurig, Urs
dc.contributor.authorKastner, Markus
dc.contributor.authorKnoll, Armin
dc.contributor.authorde Marneffe, Jean-Francois
dc.contributor.authorRangelow, Ivo
dc.contributor.authorRawlings, Colin
dc.contributor.authorDe Schepper, Peter
dc.contributor.authorSchmidt, Hans-Werner
dc.contributor.authorStrohriegl, Peter
dc.date.accessioned2021-10-21T10:22:50Z
dc.date.available2021-10-21T10:22:50Z
dc.date.issued2013
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/22851
dc.sourceIIOimport
dc.titleMolecular glass resists for all-dry high-resolution scanning probe lithography
dc.typeOral presentation
dc.contributor.imecauthorde Marneffe, Jean-Francois
dc.contributor.imecauthorDe Schepper, Peter
dc.source.peerreviewno
dc.source.conference39th International Conference on Micro and Nano Engineering
dc.source.conferencedate16/09/2013
dc.source.conferencelocationLondon UK
dc.identifier.urlhttp://www.mne2013.org/technical-program/
imec.availabilityPublished - imec


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