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Analysis of dopant diffusion and defects in fin structure using an atoministic kinetic Monte Carlo approach

dc.contributor.authorNoda, Taiji
dc.contributor.authorKambham, Ajay
dc.contributor.authorVrancken, Christa
dc.contributor.authorThean, Aaron
dc.contributor.authorHoriguchi, Naoto
dc.contributor.authorVandervorst, Wilfried
dc.date.accessioned2021-10-21T10:29:52Z
dc.date.available2021-10-21T10:29:52Z
dc.date.issued2013
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/22869
dc.sourceIIOimport
dc.titleAnalysis of dopant diffusion and defects in fin structure using an atoministic kinetic Monte Carlo approach
dc.typeProceedings paper
dc.contributor.imecauthorVrancken, Christa
dc.contributor.imecauthorThean, Aaron
dc.contributor.imecauthorHoriguchi, Naoto
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.orcidimecHoriguchi, Naoto::0000-0001-5490-0416
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage140
dc.source.endpage143
dc.source.conferenceInternational Electron Devices Meeting - IEDM
dc.source.conferencedate9/12/2013
dc.source.conferencelocationWashington, DC USA
imec.availabilityPublished - open access


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