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III-V CMP process development

dc.contributor.authorOng, Patrick
dc.contributor.authorAnsar, Sheikh
dc.contributor.authorGillot, Christophe
dc.contributor.authorLan, Yongqing
dc.contributor.authorTeugels, Lieve
dc.contributor.authorWaldron, Niamh
dc.contributor.authorProelss, Julian
dc.date.accessioned2021-10-21T10:36:07Z
dc.date.available2021-10-21T10:36:07Z
dc.date.issued2013
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/22885
dc.sourceIIOimport
dc.titleIII-V CMP process development
dc.typeProceedings paper
dc.contributor.imecauthorOng, Patrick
dc.contributor.imecauthorTeugels, Lieve
dc.contributor.imecauthorWaldron, Niamh
dc.contributor.orcidimecOng, Patrick::0000-0002-2072-292X
dc.contributor.orcidimecTeugels, Lieve::0000-0002-6613-9414
dc.source.peerreviewyes
dc.source.conferenceInternational Conference on Planarization/CMP Technology
dc.source.conferencedate30/10/2013
dc.source.conferencelocationHsinchu Taiwan
imec.availabilityPublished - imec


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