dc.contributor.author | Ong, Patrick | |
dc.contributor.author | Usman Ibrahim, Ansar | |
dc.contributor.author | Gillot, Christophe | |
dc.contributor.author | Lan, Yongqing | |
dc.contributor.author | Teugels, Lieve | |
dc.contributor.author | Waldron, Niamh | |
dc.contributor.author | Proelss, Julian | |
dc.date.accessioned | 2021-10-21T10:37:19Z | |
dc.date.available | 2021-10-21T10:37:19Z | |
dc.date.issued | 2013 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/22888 | |
dc.source | IIOimport | |
dc.title | III/V CMP process development | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Ong, Patrick | |
dc.contributor.imecauthor | Usman Ibrahim, Ansar | |
dc.contributor.imecauthor | Teugels, Lieve | |
dc.contributor.imecauthor | Waldron, Niamh | |
dc.contributor.orcidimec | Ong, Patrick::0000-0002-2072-292X | |
dc.contributor.orcidimec | Teugels, Lieve::0000-0002-6613-9414 | |
dc.source.peerreview | yes | |
dc.source.conference | International Conference on Planarization/CMP Technology | |
dc.source.conferencedate | 30/10/2013 | |
dc.source.conferencelocation | Hsinchu Taiwan | |
imec.availability | Published - imec | |