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Roughness evolution during the atomic layer deposition of metal oxides

dc.contributor.authorPeter, Antony
dc.contributor.authorDelabie, Annelies
dc.contributor.authorRodriguez, Leonard
dc.contributor.authorMoussa, Alain
dc.contributor.authorAdelmann, Christoph
dc.date.accessioned2021-10-21T10:52:05Z
dc.date.available2021-10-21T10:52:05Z
dc.date.issued2013
dc.identifier.issn0734-2101
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/22923
dc.sourceIIOimport
dc.titleRoughness evolution during the atomic layer deposition of metal oxides
dc.typeJournal article
dc.contributor.imecauthorPeter, Antony
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.imecauthorMoussa, Alain
dc.contributor.imecauthorAdelmann, Christoph
dc.contributor.orcidimecAdelmann, Christoph::0000-0002-4831-3159
dc.source.peerreviewyes
dc.source.beginpage61501
dc.source.journalJournal of Vacuum Science and Technology A
dc.source.issue31
dc.source.volume6
dc.identifier.urlhttp://dx.doi.org/10.1116/1.4812707
imec.availabilityPublished - imec


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