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dc.contributor.authorPut, Brecht
dc.contributor.authorAdelmann, Christoph
dc.contributor.authorSwerts, Johan
dc.contributor.authorRooyackers, Rita
dc.contributor.authorTielens, Hilde
dc.contributor.authorVan Elshocht, Sven
dc.contributor.authorHeyns, Marc
dc.contributor.authorRadu, Iuliana
dc.date.accessioned2021-10-21T11:08:51Z
dc.date.available2021-10-21T11:08:51Z
dc.date.issued2013
dc.identifier.issn2162-8726
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/22962
dc.sourceIIOimport
dc.titleCMOS-compatible dielectric constant engineering by embedding metallic particles in aluminum oxide
dc.typeJournal article
dc.contributor.imecauthorPut, Brecht
dc.contributor.imecauthorAdelmann, Christoph
dc.contributor.imecauthorSwerts, Johan
dc.contributor.imecauthorTielens, Hilde
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.imecauthorHeyns, Marc
dc.contributor.imecauthorRadu, Iuliana
dc.contributor.orcidimecAdelmann, Christoph::0000-0002-4831-3159
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.contributor.orcidimecRadu, Iuliana::0000-0002-7230-7218
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpageN1
dc.source.endpageN3
dc.source.journalECS Solid State Letters
dc.source.issue1
dc.source.volume2
dc.identifier.urlhttp://ssl.ecsdl.org/content/2/1/N1.full.pdf+html
imec.availabilityPublished - open access


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