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Etching of Co-Pd with significantly reduced sidewall re-deposition

dc.contributor.authorRadisic, Dunja
dc.contributor.authorNishimura, Eiichi
dc.contributor.authorKushibiki, Masato
dc.contributor.authorWataru, Shimizu
dc.contributor.authorTahara, Shigeru
dc.contributor.authorXu, Kaidong
dc.contributor.authorKim, Woosik
dc.contributor.authorBoullart, Werner
dc.date.accessioned2021-10-21T11:11:00Z
dc.date.available2021-10-21T11:11:00Z
dc.date.issued2013
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/22967
dc.sourceIIOimport
dc.titleEtching of Co-Pd with significantly reduced sidewall re-deposition
dc.typeMeeting abstract
dc.contributor.imecauthorRadisic, Dunja
dc.contributor.imecauthorBoullart, Werner
dc.contributor.orcidimecBoullart, Werner::0000-0001-7614-2097
dc.source.peerreviewyes
dc.source.beginpageD-4
dc.source.conference35th International Symposium on Dry Process
dc.source.conferencedate29/08/2013
dc.source.conferencelocationJeju Korea
imec.availabilityPublished - imec


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