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Statistical insight into controlled forming and forming free stacks for HfOx RRAM

dc.contributor.authorRaghavan, Naga
dc.contributor.authorFantini, Andrea
dc.contributor.authorDegraeve, Robin
dc.contributor.authorRoussel, Philippe
dc.contributor.authorGoux, Ludovic
dc.contributor.authorWouters, Dirk
dc.contributor.authorGroeseneken, Guido
dc.contributor.authorJurczak, Gosia
dc.date.accessioned2021-10-21T11:14:25Z
dc.date.available2021-10-21T11:14:25Z
dc.date.issued2013
dc.identifier.issn0167-9317
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/22974
dc.sourceIIOimport
dc.titleStatistical insight into controlled forming and forming free stacks for HfOx RRAM
dc.typeJournal article
dc.contributor.imecauthorFantini, Andrea
dc.contributor.imecauthorDegraeve, Robin
dc.contributor.imecauthorRoussel, Philippe
dc.contributor.imecauthorGoux, Ludovic
dc.contributor.imecauthorGroeseneken, Guido
dc.contributor.imecauthorJurczak, Gosia
dc.contributor.orcidimecRoussel, Philippe::0000-0002-0402-8225
dc.contributor.orcidimecGoux, Ludovic::0000-0002-1276-2278
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage177
dc.source.endpage181
dc.source.journalMicroelectronic Engineering
dc.source.volume109
imec.availabilityPublished - open access
imec.internalnotesINFOS 2013 Special Issue


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