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Process sensitivities in exemplary chemo-epitaxy directed self-assembly integration

dc.contributor.authorRincon Delgadillo, Paulina
dc.contributor.authorGronheid, Roel
dc.contributor.authorLin, Guanyan
dc.contributor.authorCao, Yi
dc.contributor.authorRomo Negreira, Ainhoa
dc.contributor.authorSomervell, Mark
dc.contributor.authorNafus, Kathleen
dc.contributor.authorNealey, Paul
dc.date.accessioned2021-10-21T11:24:03Z
dc.date.available2021-10-21T11:24:03Z
dc.date.issued2013
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/22996
dc.sourceIIOimport
dc.titleProcess sensitivities in exemplary chemo-epitaxy directed self-assembly integration
dc.typeProceedings paper
dc.contributor.imecauthorRincon Delgadillo, Paulina
dc.contributor.imecauthorGronheid, Roel
dc.contributor.imecauthorRomo Negreira, Ainhoa
dc.contributor.imecauthorNafus, Kathleen
dc.source.peerreviewno
dc.source.beginpage86801H
dc.source.conferenceAlternative Lithographic Technologies V
dc.source.conferencedate24/02/2013
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol. 8680


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