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Strontium doped hafnium oxide thin films: wide process window for ferroelectric memories

dc.contributor.authorSchenk, Tony
dc.contributor.authorMueller, S.
dc.contributor.authorSchroeder, Uwe
dc.contributor.authorMaterlik, R.
dc.contributor.authorKersch, A.
dc.contributor.authorPopovici, Mihaela Ioana
dc.contributor.authorAdelmann, Christoph
dc.contributor.authorVan Elshocht, Sven
dc.contributor.authorMikolajick, T.
dc.date.accessioned2021-10-21T11:46:11Z
dc.date.available2021-10-21T11:46:11Z
dc.date.issued2013
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/23044
dc.sourceIIOimport
dc.titleStrontium doped hafnium oxide thin films: wide process window for ferroelectric memories
dc.typeProceedings paper
dc.contributor.imecauthorPopovici, Mihaela Ioana
dc.contributor.imecauthorAdelmann, Christoph
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.orcidimecAdelmann, Christoph::0000-0002-4831-3159
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage260
dc.source.endpage263
dc.source.conference43rd European Solid State Device Research Conference - ESSDERC
dc.source.conferencedate16/09/2013
dc.source.conferencelocationBucharest Romania
imec.availabilityPublished - open access


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