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Understanding workfunction tuning in HKMG by Lanthanum diffusion combining simulations and measurements

dc.contributor.authorSpessot, Alessio
dc.contributor.authorCaillat, Christian
dc.contributor.authorFazan, Pierre
dc.contributor.authorRitzenthaler, Romain
dc.contributor.authorSchram, Tom
dc.date.accessioned2021-10-21T12:16:38Z
dc.date.available2021-10-21T12:16:38Z
dc.date.issued2013
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/23110
dc.sourceIIOimport
dc.titleUnderstanding workfunction tuning in HKMG by Lanthanum diffusion combining simulations and measurements
dc.typeProceedings paper
dc.contributor.imecauthorSpessot, Alessio
dc.contributor.imecauthorFazan, Pierre
dc.contributor.imecauthorRitzenthaler, Romain
dc.contributor.imecauthorSchram, Tom
dc.contributor.orcidimecRitzenthaler, Romain::0000-0002-8615-3272
dc.contributor.orcidimecSchram, Tom::0000-0003-1533-7055
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage113
dc.source.endpage116
dc.source.conferenceInternational Conference on Simulation of Semiconductor Processes and Devices - SISPAD
dc.source.conferencedate3/09/2013
dc.source.conferencelocationGlasgow UK
dc.identifier.urlhttp://ieeexplore.ieee.org/xpl/articleDetails.jsp?tp=&arnumber=6650587&queryText%3DUnderstanding+Workfunction+Tuning+in+HKMG+by+
imec.availabilityPublished - open access


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