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dc.contributor.authorTamaddon, Amir-Hossein
dc.contributor.authorBelmiloud, Naser
dc.contributor.authorDoumen, Geert
dc.contributor.authorStruyf, Herbert
dc.contributor.authorMertens, Paul
dc.contributor.authorHeyns, Marc
dc.date.accessioned2021-10-21T12:34:21Z
dc.date.available2021-10-21T12:34:21Z
dc.date.issued2013
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/23149
dc.sourceIIOimport
dc.titleEvaluation of high-speed linear air-knife based wafer dryer
dc.typeProceedings paper
dc.contributor.imecauthorTamaddon, Amir-Hossein
dc.contributor.imecauthorDoumen, Geert
dc.contributor.imecauthorStruyf, Herbert
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecTamaddon, Amir-Hossein::0000-0003-4566-0697
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage239
dc.source.endpage242
dc.source.conferenceUltra Clean Processing of Semiconductor Surfaces XI - UCPSS
dc.source.conferencedate17/09/2012
dc.source.conferencelocationGent Belgium
imec.availabilityPublished - open access
imec.internalnotesSolid State Phenomena; Vol. 195


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