Show simple item record

Watermark formation mechanism by evaporation of ultra-pure water: Study the effect of ambient

dc.contributor.authorTamaddon, Amir-Hossein
dc.contributor.authorMertens, Paul
dc.contributor.authorVereecke, Guy
dc.contributor.authorHolsteyns, Frank
dc.contributor.authorDoumen, Geert
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorHeyns, Marc
dc.date.accessioned2021-10-21T12:35:21Z
dc.date.available2021-10-21T12:35:21Z
dc.date.issued2013
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/23151
dc.sourceIIOimport
dc.titleWatermark formation mechanism by evaporation of ultra-pure water: Study the effect of ambient
dc.typeProceedings paper
dc.contributor.imecauthorTamaddon, Amir-Hossein
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorVereecke, Guy
dc.contributor.imecauthorHolsteyns, Frank
dc.contributor.imecauthorDoumen, Geert
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecTamaddon, Amir-Hossein::0000-0003-4566-0697
dc.contributor.orcidimecVereecke, Guy::0000-0001-9058-9338
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage183
dc.source.endpage190
dc.source.conferenceSemiconductor Cleaning Science and Technology 13
dc.source.conferencedate27/10/2013
dc.source.conferencelocationSan Francisco, CA USA
dc.identifier.urlhttp://ecst.ecsdl.org/content/58/6/183.abstract
imec.availabilityPublished - open access
imec.internalnotesECS Transactions; Vol. 58, Issue 6


Files in this item

Thumbnail
Name:
28505.pdf
Size:
396.6Kb
Format:
PDF
View/open

This item appears in the following collection(s)

Show simple item record