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Optimized insitu rinsing for HF last processes

dc.contributor.authorWolke, K.
dc.contributor.authorKübelbeck, A.
dc.contributor.authorCornelissen, Ingrid
dc.contributor.authorMeuris, Marc
dc.contributor.authorOshinowo, J.
dc.date.accessioned2021-09-30T10:09:15Z
dc.date.available2021-09-30T10:09:15Z
dc.date.issued1997
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/2315
dc.sourceIIOimport
dc.titleOptimized insitu rinsing for HF last processes
dc.typeProceedings paper
dc.contributor.imecauthorCornelissen, Ingrid
dc.contributor.imecauthorMeuris, Marc
dc.contributor.orcidimecMeuris, Marc::0000-0002-9580-6810
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.conferenceIEEE International Symposium on Semiconductor Manufacturing Conference
dc.source.conferencedate6/10/1997
dc.source.conferencelocationSan Francisco, CA USA
imec.availabilityPublished - open access


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