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The effect of material texture in the CMP of ruthenium films

dc.contributor.authorTeugels, Lieve
dc.contributor.authorAmanapu, Hariprasad
dc.contributor.authorSagi, Kaushik
dc.contributor.authorHeylen, Nancy
dc.contributor.authorBabu, S.V.
dc.date.accessioned2021-10-21T12:39:56Z
dc.date.available2021-10-21T12:39:56Z
dc.date.issued2013
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/23161
dc.sourceIIOimport
dc.titleThe effect of material texture in the CMP of ruthenium films
dc.typeProceedings paper
dc.contributor.imecauthorTeugels, Lieve
dc.contributor.imecauthorHeylen, Nancy
dc.contributor.orcidimecTeugels, Lieve::0000-0002-6613-9414
dc.source.peerreviewno
dc.source.conference18th International Symposium on Chemical-Mechanical Planarization - CAMP
dc.source.conferencedate11/08/2013
dc.source.conferencelocationLake Placid, NY USA
imec.availabilityPublished - imec


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