Show simple item record

Modeling fluorocarbon plasmas used for etching of Si

dc.contributor.authorTinck, Stefan
dc.contributor.authorMilenin, Alexey
dc.contributor.authorBogaerts, Annemie
dc.date.accessioned2021-10-21T12:44:38Z
dc.date.available2021-10-21T12:44:38Z
dc.date.issued2013
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/23170
dc.sourceIIOimport
dc.titleModeling fluorocarbon plasmas used for etching of Si
dc.typeMeeting abstract
dc.contributor.imecauthorMilenin, Alexey
dc.contributor.orcidimecMilenin, Alexey::0000-0003-0747-0462
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.conferencePlasma Etch and Strip in Microtechnology - PESM
dc.source.conferencedate14/03/2013
dc.source.conferencelocationLeuven Belgium
imec.availabilityPublished - open access


Files in this item

Thumbnail
Name:
26848.pdf
Size:
67.01Kb
Format:
PDF
View/open

This item appears in the following collection(s)

Show simple item record