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Crystal orientation dependent anisotropic dry silicon etching

dc.contributor.authorTrompoukis, Christos
dc.contributor.authorEl Daif, Ounsi
dc.contributor.authorVerdonck, Patrick
dc.contributor.authorNiesen, Bjoern
dc.contributor.authorBen Yaala, Marwa
dc.contributor.authorDepauw, Valerie
dc.contributor.authorGordon, Ivan
dc.contributor.authorPoortmans, Jef
dc.date.accessioned2021-10-21T12:54:59Z
dc.date.available2021-10-21T12:54:59Z
dc.date.issued2013
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/23190
dc.sourceIIOimport
dc.titleCrystal orientation dependent anisotropic dry silicon etching
dc.typeMeeting abstract
dc.contributor.imecauthorVerdonck, Patrick
dc.contributor.imecauthorDepauw, Valerie
dc.contributor.imecauthorGordon, Ivan
dc.contributor.imecauthorPoortmans, Jef
dc.contributor.orcidimecVerdonck, Patrick::0000-0003-2454-0602
dc.contributor.orcidimecDepauw, Valerie::0000-0003-2045-9698
dc.contributor.orcidimecGordon, Ivan::0000-0002-0713-8403
dc.contributor.orcidimecPoortmans, Jef::0000-0003-2077-2545
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.conferencePlasma Etch and Strip in Microtechnology - PESM
dc.source.conferencedate14/03/2013
dc.source.conferencelocationLeuven Belgium
imec.availabilityPublished - open access


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