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Characterization of porous structures in advanced low-k films with thin TaN layers using monoenergetic positron beams

dc.contributor.authorUedono, Akira
dc.contributor.authorVerdonck, Patrick
dc.contributor.authorDelabie, Annelies
dc.contributor.authorSwerts, Johan
dc.contributor.authorWitters, Thomas
dc.contributor.authorConard, Thierry
dc.contributor.authorBaklanov, Mikhaïl
dc.contributor.authorVan Elshocht, Sven
dc.contributor.authorOshima, Nagayasu
dc.contributor.authorSuzuki, Ryoichi
dc.date.accessioned2021-10-21T13:00:54Z
dc.date.available2021-10-21T13:00:54Z
dc.date.issued2013
dc.identifier.issn0021-4922
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/23202
dc.sourceIIOimport
dc.titleCharacterization of porous structures in advanced low-k films with thin TaN layers using monoenergetic positron beams
dc.typeJournal article
dc.contributor.imecauthorVerdonck, Patrick
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.imecauthorSwerts, Johan
dc.contributor.imecauthorWitters, Thomas
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.orcidimecVerdonck, Patrick::0000-0003-2454-0602
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.source.peerreviewyes
dc.source.beginpage106501
dc.source.journalJapanese Journal of Applied Physics
dc.source.issue10
dc.source.volume52
dc.identifier.urlhttp://dx.doi.org/10.7567/JJAP.52.106501
imec.availabilityPublished - imec


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