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Mask effects on resist variability in extreme ultraviolet lithography

dc.contributor.authorVaglio Pret, Alessandro
dc.contributor.authorGronheid, Roel
dc.contributor.authorEngelen, Jan
dc.contributor.authorYan, Pei-Yang
dc.contributor.authorLeeson, Michael
dc.contributor.authorYounkin, Todd
dc.contributor.authorGaridis, Kostas
dc.contributor.authorBiafore, John
dc.date.accessioned2021-10-21T13:04:13Z
dc.date.available2021-10-21T13:04:13Z
dc.date.issued2013
dc.identifier.issn0021-4922
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/23209
dc.sourceIIOimport
dc.titleMask effects on resist variability in extreme ultraviolet lithography
dc.typeJournal article
dc.contributor.imecauthorVaglio Pret, Alessandro
dc.contributor.imecauthorGronheid, Roel
dc.source.peerreviewyes
dc.source.beginpage03GC02
dc.source.journalJapanese Journal of Applied Physics
dc.source.issue6
dc.source.volume52
dc.identifier.urlhttp://jjap.jsap.jp/link?JJAP/52/06GC02/
imec.availabilityPublished - imec


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