Roughness and variability in EUV lithography: Who is to blame? (Part 1)

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Authors
Vaglio Pret, Alessandro; Gronheid, Roel; Younkin, Todd; Winroth, Gustaf; Biafore, John; Anno, Yusuke; Hoshiko, Kenji; Constantoudis, Vassilios
Conference
Extreme Ultraviolet (EUV) Lithography IV
Title
Roughness and variability in EUV lithography: Who is to blame? (Part 1)
Publication type
Proceedings paper
Embargo date
9999-12-31
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