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2D and 3D photoresist line roughness characterization

dc.contributor.authorVaglio Pret, Alessandro
dc.contributor.authorKunnen, Eddy
dc.contributor.authorGronheid, Roel
dc.contributor.authorPargon, Erwine
dc.contributor.authorLuere, Olivier
dc.contributor.authorBianchi, Davide
dc.date.accessioned2021-10-21T13:05:14Z
dc.date.available2021-10-21T13:05:14Z
dc.date.issued2013
dc.identifier.issn0167-9317
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/23211
dc.sourceIIOimport
dc.title2D and 3D photoresist line roughness characterization
dc.typeJournal article
dc.contributor.imecauthorVaglio Pret, Alessandro
dc.contributor.imecauthorGronheid, Roel
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage100
dc.source.endpage107
dc.source.journalMicroelectronic Engineering
dc.source.volume110
imec.availabilityPublished - open access


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