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Integration challenges and options of replacement high-k/metal gate technology for (Sub-)22nm technology nodes

dc.contributor.authorVeloso, Anabela
dc.contributor.authorRagnarsson, Lars-Ake
dc.contributor.authorSchram, Tom
dc.contributor.authorChew, Soon Aik
dc.contributor.authorBoccardi, Guillaume
dc.contributor.authorThean, Aaron
dc.contributor.authorHoriguchi, Naoto
dc.date.accessioned2021-10-21T13:58:32Z
dc.date.available2021-10-21T13:58:32Z
dc.date.issued2013
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/23318
dc.sourceIIOimport
dc.titleIntegration challenges and options of replacement high-k/metal gate technology for (Sub-)22nm technology nodes
dc.typeProceedings paper
dc.contributor.imecauthorVeloso, Anabela
dc.contributor.imecauthorRagnarsson, Lars-Ake
dc.contributor.imecauthorSchram, Tom
dc.contributor.imecauthorBoccardi, Guillaume
dc.contributor.imecauthorThean, Aaron
dc.contributor.imecauthorHoriguchi, Naoto
dc.contributor.orcidimecRagnarsson, Lars-Ake::0000-0003-1057-8140
dc.contributor.orcidimecSchram, Tom::0000-0003-1533-7055
dc.contributor.orcidimecBoccardi, Guillaume::0000-0003-3226-4572
dc.contributor.orcidimecHoriguchi, Naoto::0000-0001-5490-0416
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage385
dc.source.endpage390
dc.source.conferenceChina Semiconductor Technology International Conference - CSTIC
dc.source.conferencedate17/03/2013
dc.source.conferencelocationShanghai China
imec.availabilityPublished - open access
imec.internalnotesECS Transactions; Vol. 52, Issue1


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