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Detailed characterization of the effects of plasma treatments on an advanced 2.0 low-k material

dc.contributor.authorVerdonck, Patrick
dc.contributor.authorMaheshwari, Abhishek
dc.contributor.authorSwerts, Johan
dc.contributor.authorTielens, Hilde
dc.contributor.authorFranquet, Alexis
dc.contributor.authorLoyo Prado, Jana
dc.contributor.authorArmini, Silvia
dc.contributor.authorBaklanov, Mikhaïl
dc.contributor.authorVan Elshocht, Sven
dc.contributor.authorUedono, Akira
dc.contributor.authorRoque Huanca, Danilo
dc.contributor.authorGomes dos Santos Filho, Sebastiao
dc.contributor.authorKellerman, Guinther
dc.date.accessioned2021-10-21T14:02:17Z
dc.date.available2021-10-21T14:02:17Z
dc.date.issued2013
dc.identifier.issn2162-8769
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/23325
dc.sourceIIOimport
dc.titleDetailed characterization of the effects of plasma treatments on an advanced 2.0 low-k material
dc.typeJournal article
dc.contributor.imecauthorVerdonck, Patrick
dc.contributor.imecauthorSwerts, Johan
dc.contributor.imecauthorTielens, Hilde
dc.contributor.imecauthorFranquet, Alexis
dc.contributor.imecauthorLoyo Prado, Jana
dc.contributor.imecauthorArmini, Silvia
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.orcidimecVerdonck, Patrick::0000-0003-2454-0602
dc.contributor.orcidimecFranquet, Alexis::0000-0002-7371-8852
dc.contributor.orcidimecArmini, Silvia::0000-0003-0578-3422
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpageN103
dc.source.endpageN109
dc.source.journalECS Journal of Solid State Science and Technology
dc.source.issue5
dc.source.volume2
dc.identifier.urlhttp://jss.ecsdl.org/content/2/5/N103.short
imec.availabilityPublished - open access


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