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dc.contributor.authorVereecke, Guy
dc.contributor.authorXu, XiuMei
dc.contributor.authorTsai, Wei-Kang
dc.contributor.authorYang, Hui
dc.contributor.authorArmini, Silvia
dc.contributor.authorDelande, Tinne
dc.contributor.authorDoumen, Geert
dc.contributor.authorKentie, Frank
dc.contributor.authorShi, Xiaoping
dc.contributor.authorSimms, Ihsan
dc.contributor.authorNafus, Kathleen
dc.contributor.authorHolsteyns, Frank
dc.contributor.authorStruyf, Herbert
dc.contributor.authorDe Gendt, Stefan
dc.date.accessioned2021-10-21T14:06:29Z
dc.date.available2021-10-21T14:06:29Z
dc.date.issued2013
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/23333
dc.sourceIIOimport
dc.titleWetting behavior of aqueous solutions on high aspect ratio nanopillars with hydrophilic surface finish
dc.typeProceedings paper
dc.contributor.imecauthorVereecke, Guy
dc.contributor.imecauthorXu, XiuMei
dc.contributor.imecauthorArmini, Silvia
dc.contributor.imecauthorDelande, Tinne
dc.contributor.imecauthorDoumen, Geert
dc.contributor.imecauthorNafus, Kathleen
dc.contributor.imecauthorHolsteyns, Frank
dc.contributor.imecauthorStruyf, Herbert
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.orcidimecVereecke, Guy::0000-0001-9058-9338
dc.contributor.orcidimecXu, XiuMei::0000-0002-3356-8693
dc.contributor.orcidimecArmini, Silvia::0000-0003-0578-3422
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage171
dc.source.endpage182
dc.source.conferenceSemiconductor Cleaning Science and Technology 13
dc.source.conferencedate27/10/2013
dc.source.conferencelocationSan Francisco, CA USA
dc.identifier.urlhttp://ecst.ecsdl.org/content/58/6/171.abstract
imec.availabilityPublished - open access
imec.internalnotesECS Transactions; Vol. 58, Issue 6


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