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Precuring implant photoresists for shrink and patterning control

dc.contributor.authorWinroth, Gustaf
dc.contributor.authorRosseel, Erik
dc.contributor.authorDelvaux, Christie
dc.contributor.authorAltamirano Sanchez, Efrain
dc.contributor.authorErcken, Monique
dc.date.accessioned2021-10-21T14:37:57Z
dc.date.available2021-10-21T14:37:57Z
dc.date.issued2013
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/23396
dc.sourceIIOimport
dc.titlePrecuring implant photoresists for shrink and patterning control
dc.typeProceedings paper
dc.contributor.imecauthorRosseel, Erik
dc.contributor.imecauthorDelvaux, Christie
dc.contributor.imecauthorAltamirano Sanchez, Efrain
dc.contributor.imecauthorErcken, Monique
dc.source.peerreviewyes
dc.source.beginpage868207
dc.source.conferenceAdvances in Resist Materials and Processing Technology XXX
dc.source.conferencedate24/02/2013
dc.source.conferencelocationSan Diego, CA USA
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol. 8682


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