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Wetting challenges in cleaning of high aspect ratio nano-structures

dc.contributor.authorXu, XiuMei
dc.contributor.authorVereecke, Guy
dc.contributor.authorvan den Hoogen, Erik
dc.contributor.authorSmeers, Jens
dc.contributor.authorArmini, Silvia
dc.contributor.authorDelande, Tinne
dc.contributor.authorStruyf, Herbert
dc.date.accessioned2021-10-21T14:48:49Z
dc.date.available2021-10-21T14:48:49Z
dc.date.issued2013
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/23415
dc.sourceIIOimport
dc.titleWetting challenges in cleaning of high aspect ratio nano-structures
dc.typeProceedings paper
dc.contributor.imecauthorXu, XiuMei
dc.contributor.imecauthorVereecke, Guy
dc.contributor.imecauthorArmini, Silvia
dc.contributor.imecauthorDelande, Tinne
dc.contributor.imecauthorStruyf, Herbert
dc.contributor.orcidimecXu, XiuMei::0000-0002-3356-8693
dc.contributor.orcidimecVereecke, Guy::0000-0001-9058-9338
dc.contributor.orcidimecArmini, Silvia::0000-0003-0578-3422
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage235
dc.source.endpage238
dc.source.conferenceUltra Clean Processing of Semiconductor Surfaces XI - UCPSS
dc.source.conferencedate17/09/2012
dc.source.conferencelocationGent Belgium
imec.availabilityPublished - open access
imec.internalnotesSolid State Phenomena; Vol. 195


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