dc.contributor.author | Xu, XiuMei | |
dc.contributor.author | Vereecke, Guy | |
dc.contributor.author | van den Hoogen, Erik | |
dc.contributor.author | Smeers, Jens | |
dc.contributor.author | Armini, Silvia | |
dc.contributor.author | Delande, Tinne | |
dc.contributor.author | Struyf, Herbert | |
dc.date.accessioned | 2021-10-21T14:48:49Z | |
dc.date.available | 2021-10-21T14:48:49Z | |
dc.date.issued | 2013 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/23415 | |
dc.source | IIOimport | |
dc.title | Wetting challenges in cleaning of high aspect ratio nano-structures | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Xu, XiuMei | |
dc.contributor.imecauthor | Vereecke, Guy | |
dc.contributor.imecauthor | Armini, Silvia | |
dc.contributor.imecauthor | Delande, Tinne | |
dc.contributor.imecauthor | Struyf, Herbert | |
dc.contributor.orcidimec | Xu, XiuMei::0000-0002-3356-8693 | |
dc.contributor.orcidimec | Vereecke, Guy::0000-0001-9058-9338 | |
dc.contributor.orcidimec | Armini, Silvia::0000-0003-0578-3422 | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 235 | |
dc.source.endpage | 238 | |
dc.source.conference | Ultra Clean Processing of Semiconductor Surfaces XI - UCPSS | |
dc.source.conferencedate | 17/09/2012 | |
dc.source.conferencelocation | Gent Belgium | |
imec.availability | Published - open access | |
imec.internalnotes | Solid State Phenomena; Vol. 195 | |