Damage free cryogenic etching of a porous organosilica ultralow-k film

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Authors

Zhang, Liping; Leffaucheux, P.; Tillocher, T.; Dussart, R.; Mankelevich, Y.; de Marneffe, Jean-Francois; De Gendt, Stefan; Baklanov, Mikhaïl

ISSN

1099-0062

Issue

2

Journal

Electrochemical and Solid-State Letters

Volume

2

Title

Damage free cryogenic etching of a porous organosilica ultralow-k film

Publication type

Journal article

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