dc.contributor.author | Zhang, Liping | |
dc.contributor.author | Leffaucheux, P. | |
dc.contributor.author | Tillocher, T. | |
dc.contributor.author | Dussart, R. | |
dc.contributor.author | Mankelevich, Y. | |
dc.contributor.author | de Marneffe, Jean-Francois | |
dc.contributor.author | De Gendt, Stefan | |
dc.contributor.author | Baklanov, Mikhaïl | |
dc.date.accessioned | 2021-10-21T15:03:24Z | |
dc.date.available | 2021-10-21T15:03:24Z | |
dc.date.issued | 2013 | |
dc.identifier.issn | 1099-0062 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/23442 | |
dc.source | IIOimport | |
dc.title | Damage free cryogenic etching of a porous organosilica ultralow-k film | |
dc.type | Journal article | |
dc.contributor.imecauthor | Zhang, Liping | |
dc.contributor.imecauthor | de Marneffe, Jean-Francois | |
dc.contributor.imecauthor | De Gendt, Stefan | |
dc.contributor.orcidimec | De Gendt, Stefan::0000-0003-3775-3578 | |
dc.source.peerreview | yes | |
dc.source.beginpage | N5 | |
dc.source.endpage | N7 | |
dc.source.journal | Electrochemical and Solid-State Letters | |
dc.source.issue | 2 | |
dc.source.volume | 2 | |
imec.availability | Published - imec | |