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Atomic layer deposition of Ru thin films using the zero-valence precursor EBECH Ru

dc.contributor.authorAdelmann, Christoph
dc.contributor.authorPopovici, Mihaela Ioana
dc.contributor.authorGroven, Benjamin
dc.contributor.authorMoens, Kristof
dc.contributor.authorMeersschaut, Johan
dc.contributor.authorFranquet, Alexis
dc.contributor.authorSwerts, Johan
dc.contributor.authorDelabie, Annelies
dc.contributor.authorVan Elshocht, Sven
dc.date.accessioned2021-10-22T00:43:05Z
dc.date.available2021-10-22T00:43:05Z
dc.date.issued2014
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/23468
dc.sourceIIOimport
dc.titleAtomic layer deposition of Ru thin films using the zero-valence precursor EBECH Ru
dc.typeOral presentation
dc.contributor.imecauthorAdelmann, Christoph
dc.contributor.imecauthorPopovici, Mihaela Ioana
dc.contributor.imecauthorGroven, Benjamin
dc.contributor.imecauthorMoens, Kristof
dc.contributor.imecauthorMeersschaut, Johan
dc.contributor.imecauthorFranquet, Alexis
dc.contributor.imecauthorSwerts, Johan
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.orcidimecAdelmann, Christoph::0000-0002-4831-3159
dc.contributor.orcidimecGroven, Benjamin::0000-0002-5781-7594
dc.contributor.orcidimecMeersschaut, Johan::0000-0003-2467-1784
dc.contributor.orcidimecFranquet, Alexis::0000-0002-7371-8852
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.source.peerreviewno
dc.source.conference1st Belux Workshop on Coating, Materials, Surfaces and Interfaces
dc.source.conferencedate11/09/2014
dc.source.conferencelocationBelvaux Luxemburg
imec.availabilityPublished - imec


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