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Improving on-wafer CD correlation analysis using advanced diagnostics and across-wafer light-source monitoring

dc.contributor.authorAlagna, Paolo
dc.contributor.authorZurita, Omar
dc.contributor.authorRechtsteiner, Greg
dc.contributor.authorLalovic, Ivan
dc.contributor.authorBekaert, Joost
dc.date.accessioned2021-10-22T00:43:23Z
dc.date.available2021-10-22T00:43:23Z
dc.date.issued2014
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/23484
dc.sourceIIOimport
dc.titleImproving on-wafer CD correlation analysis using advanced diagnostics and across-wafer light-source monitoring
dc.typeProceedings paper
dc.contributor.imecauthorAlagna, Paolo
dc.contributor.imecauthorBekaert, Joost
dc.contributor.orcidimecBekaert, Joost::0000-0003-3075-3479
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage905228
dc.source.conferenceOptical Microlithography XXVII
dc.source.conferencedate23/02/2014
dc.source.conferencelocationSan Jose, CA USA
dc.identifier.urlhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=1860281
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 9052


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