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Mitigating mask roughness via pupil filtering

dc.contributor.authorBaylav, Burak
dc.contributor.authorMaloney, Chris
dc.contributor.authorLevinson, Zac
dc.contributor.authorBekaert, Joost
dc.contributor.authorVaglio Pret, Alessandro
dc.contributor.authorSmith, Bruce
dc.date.accessioned2021-10-22T00:45:09Z
dc.date.available2021-10-22T00:45:09Z
dc.date.issued2014
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/23524
dc.sourceIIOimport
dc.titleMitigating mask roughness via pupil filtering
dc.typeProceedings paper
dc.contributor.imecauthorBekaert, Joost
dc.contributor.imecauthorVaglio Pret, Alessandro
dc.contributor.orcidimecBekaert, Joost::0000-0003-3075-3479
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage90521O
dc.source.conferenceOptical Microlithography XXVII
dc.source.conferencedate23/02/2014
dc.source.conferencelocationSan Jose, CA USA
dc.identifier.urlhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=1857412
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 9052


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