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Contact hole multiplication using grapho-epitaxy directed self-assembly: process choices, template optimization, and placement accuracy

dc.contributor.authorBekaert, Joost
dc.contributor.authorGronheid, Roel
dc.contributor.authorMKuppuswamy, Vijaya Kumar
dc.contributor.authorDoise, Jan
dc.contributor.authorChan, BT
dc.contributor.authorVandenberghe, Geert
dc.contributor.authorSayan, Safak
dc.contributor.authorCao, Yi
dc.contributor.authorHer, YoungJun
dc.date.accessioned2021-10-22T00:45:31Z
dc.date.available2021-10-22T00:45:31Z
dc.date.issued2014
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/23530
dc.sourceIIOimport
dc.titleContact hole multiplication using grapho-epitaxy directed self-assembly: process choices, template optimization, and placement accuracy
dc.typeOral presentation
dc.contributor.imecauthorBekaert, Joost
dc.contributor.imecauthorGronheid, Roel
dc.contributor.imecauthorDoise, Jan
dc.contributor.imecauthorChan, BT
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.imecauthorHer, YoungJun
dc.contributor.orcidimecBekaert, Joost::0000-0003-3075-3479
dc.contributor.orcidimecChan, BT::0000-0003-2890-0388
dc.source.peerreviewno
dc.source.conferencePhotomask Technology (BACUS 2014)
dc.source.conferencedate16/09/2014
dc.source.conferencelocationMonterey, CA USA
imec.availabilityPublished - imec


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