dc.contributor.author | Bekaert, Joost | |
dc.contributor.author | Gronheid, Roel | |
dc.contributor.author | MKuppuswamy, Vijaya Kumar | |
dc.contributor.author | Doise, Jan | |
dc.contributor.author | Chan, BT | |
dc.contributor.author | Vandenberghe, Geert | |
dc.contributor.author | Sayan, Safak | |
dc.contributor.author | Cao, Yi | |
dc.contributor.author | Her, YoungJun | |
dc.date.accessioned | 2021-10-22T00:45:31Z | |
dc.date.available | 2021-10-22T00:45:31Z | |
dc.date.issued | 2014 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/23530 | |
dc.source | IIOimport | |
dc.title | Contact hole multiplication using grapho-epitaxy directed self-assembly: process choices, template optimization, and placement accuracy | |
dc.type | Oral presentation | |
dc.contributor.imecauthor | Bekaert, Joost | |
dc.contributor.imecauthor | Gronheid, Roel | |
dc.contributor.imecauthor | Doise, Jan | |
dc.contributor.imecauthor | Chan, BT | |
dc.contributor.imecauthor | Vandenberghe, Geert | |
dc.contributor.imecauthor | Her, YoungJun | |
dc.contributor.orcidimec | Bekaert, Joost::0000-0003-3075-3479 | |
dc.contributor.orcidimec | Chan, BT::0000-0003-2890-0388 | |
dc.source.peerreview | no | |
dc.source.conference | Photomask Technology (BACUS 2014) | |
dc.source.conferencedate | 16/09/2014 | |
dc.source.conferencelocation | Monterey, CA USA | |
imec.availability | Published - imec | |