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Single step alkaline cleaning solution for advanced semiconductor cleaning

dc.contributor.authorBaeyens, Martien
dc.contributor.authorHub, W.
dc.contributor.authorKolbesen, B. O.
dc.contributor.authorMartin, A.R.
dc.contributor.authorMertens, Paul
dc.date.accessioned2021-09-30T11:25:41Z
dc.date.available2021-09-30T11:25:41Z
dc.date.issued1998
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/2361
dc.sourceIIOimport
dc.titleSingle step alkaline cleaning solution for advanced semiconductor cleaning
dc.typeOral presentation
dc.contributor.imecauthorMertens, Paul
dc.source.peerreviewno
dc.source.conference4th International Symposium on Ultra Clean Processing of Silicon Surfaces - UCPSS
dc.source.conferencedate21/09/1998
dc.source.conferencelocationOostende Belgium
imec.availabilityPublished - imec
imec.internalnotesPubl. in 1999; Zie C3167


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