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High speed optical metrology solution for after etch process monitoring and control

dc.contributor.authorCharley, Anne-Laure
dc.contributor.authorLeray, Philippe
dc.contributor.authorPypen, Wouter
dc.contributor.authorCheng, Shaunee
dc.contributor.authorVerma, Alok
dc.contributor.authorMattheus, Christine
dc.contributor.authorWisse, Baukje
dc.contributor.authorCramer, Hugo
dc.contributor.authorNiesing, Henk
dc.contributor.authorKruijswijk, Stefan
dc.date.accessioned2021-10-22T00:54:20Z
dc.date.available2021-10-22T00:54:20Z
dc.date.issued2014
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/23624
dc.sourceIIOimport
dc.titleHigh speed optical metrology solution for after etch process monitoring and control
dc.typeProceedings paper
dc.contributor.imecauthorCharley, Anne-Laure
dc.contributor.imecauthorLeray, Philippe
dc.source.peerreviewyes
dc.source.beginpage90501H
dc.source.conferenceMetrology, Inspection, and Process Control for Microlithography XXVIII
dc.source.conferencedate23/02/2014
dc.source.conferencelocationSan Jose, CA USA
dc.identifier.urlhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=1859781
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol. 9050


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