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Limitation of HF-based chemistry for deep-submicron contact hole cleaning on silicides

dc.contributor.authorBaklanov, Mikhaïl
dc.contributor.authorKondoh, Eiichi
dc.contributor.authorAlves Donaton, Ricardo
dc.contributor.authorVanhaelemeersch, Serge
dc.contributor.authorMaex, Karen
dc.date.accessioned2021-09-30T11:25:44Z
dc.date.available2021-09-30T11:25:44Z
dc.date.issued1998
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/2362
dc.sourceIIOimport
dc.titleLimitation of HF-based chemistry for deep-submicron contact hole cleaning on silicides
dc.typeJournal article
dc.contributor.imecauthorVanhaelemeersch, Serge
dc.contributor.imecauthorMaex, Karen
dc.contributor.orcidimecVanhaelemeersch, Serge::0000-0003-2102-7395
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage3240
dc.source.endpage3246
dc.source.journalJournal of the Electrochemical Society
dc.source.issue9
dc.source.volume145
imec.availabilityPublished - open access


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